Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.
Standard Electronic Grade
Assay (H202): 30.0%
SEMI Grade
Trace impurities measured in PPB. See "Documents" sub-tab below for "Product Datasheet" link.
12 x 1-Pint Poly Bottles/Case (Cases Only)
Manufacturer: Avantor
Manufacturer Part No: JT-2204-01
Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.